本电源适用于离子镀各种功能膜，硬质膜，金属膜，可以有效减少膜层应力，降低摩擦技术，减少晶体缺陷，特别适用于低温沉积各种膜系。而且本电源可以直流模式，脉冲模式两种方式切换工作。

The power supply is suitable for ion plating various functional films, hard films, and metal films. It can effectively reduce film layer stress, lower friction technology, and minimize crystal defects. It is especially suited for low-temperature deposition of various film systems. Moreover, this power supply can switch between direct current (DC) mode and pulse mode for operation.