本公司脉冲直流磁控溅射电源具备如下显著特点:

1.采用先进的逆变技术与进口IGBT模块搭配设计有效减少电荷累积效应，提升膜层质量。

2.理想的电压陡降特性，充分适配镀膜工艺连续性需求电源参数大范围连续可调，控制精度高具有抑制靶材弧光放电及抗短路功能。

3.本电源适用于金属、合金、石墨等靶材镀制金属膜、碳膜以及部分氧化物、氮化物和碳化物膜等工艺。

Our company's Pulsed Direct Current Magnetron Sputtering Power Supply has the following distinctive features:

1. By adopting advanced inverter technology paired with imported IGBT modules, it effectively reduces the charge accumulation effect, enhancing film layer quality.

2. It offers ideal voltage drop characteristics, fully accommodating the continuous requirements of the coating process. The power supply parameters can be adjusted continuously over a wide range, with high control accuracy. It also features arc suppression for target materials and short-circuit resistance.

3. This power supply is suitable for sputtering metal films, carbon films, and certain oxides, nitrides, and carbides from target materials such as metals, alloys, and graphite.